CVD Equipment Corporation Releases Silicon Carbide (SiC) PVT System Platform

Semiconductor Review | Thursday, May 11, 2023

CVD Equipment Corporation introduces the PVT150TM, a physical vapor transport (PVT) system for silicon carbide (SiC) crystal boule growth. The PVT150TM model is a compact platform design, exclusively engineered for growing 150 mm diameter boules/ingots and is upgradable to 200 mm (PVT200TM). The Company plans to launch its PVT200TM in Q3 2023.

The PVT150TM /PVT200TM are robust production systems with RF Induction Heating, enhanced process controls that stabilize temperature +/- 0.5°C at 2500°C and pressure at +/- 1% of set point and is MES (Manufacturing Execution System) compatible. Automatic process chamber load and unload, recipe start, crucible stage rotation and motorized pyrometer alignment by remote-control box for real-time monitoring of the crucible during crystal growth are some of the many system features that drive efficiencies. Automated positionable coil with axial vertical travel allows for thermal gradient control to optimize SiC boule growth.

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“Our PVT product series provides unmatched precision and reliable control of all process parameters. This allows for high yield run to run repeatability as well as system to system matching. CVD Equipment’s product portfolio includes turnkey configured systems as well as customized solutions to fit varying crucible designs. Our expanded internal vertical production capacity enables lead times as short as 6 months ARO. The primary focus being customer satisfaction, performance and “enabling tomorrow’s technologies,” said Emmanuel Lakios, President and CEO of CVD Equipment Corporation.

CVD Equipment Corporation has expanded their U.S. manufacturing facility (128,000 ft2 ) located in Central Islip, NY, ramping up their production capacity for high-quality, high-performance PVT systems.

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